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Rapid Thermal Process Ovens
We are specialized in developing of rapid thermal annealing systems, mainly for R&D use. Actually we offer 2 different systems, depending on customers process demands. For special applications, wishes or options please do not hesitate to contact us.
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Model |
for wafer/substrate size |  Tmax °C | ramp up rate | ramp down rate | specials |
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RTP-1000-150
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150mm,6 | 1000 °C | 75 °K/sec | T=1000 °C up to 400 °C better 200 K/min.
T= 400 °C up to 100 °C max. 30 K/min. | |
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RTP-1200-100
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100mm², 100mmø | 1200 °C | 150 K/sec | T=1200 °C up to 400 °C better 200 K/min.
T= 400 °C up to 100 °C max. 30K/min. | |
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