Rapid Thermal Process Ovens
We are specialized in developing of rapid thermal annealing systems, mainly for R&D use. Actually we offer 3 different systems, depending on customers process demands. For special applications, wishes or options please do not hesitate to contact us.
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Model |
for wafer/substrate size |  Tmax °C | ramp up rate | ramp down rate | specials |
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RTP-1000-150 Front loading
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150 mm diam or 6 inch | 1000 °C | 75 K/sec | T=1000 °C up to 400 °C better 200 K/min
T= 400 °C up to 100 °C max. 30 K/min | |
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VPO-1000-300 Top loading
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300 mm | 1000 °C | 40 K/sec | T=1000 °C up to 400 °C better 200 K/min
T= 400 °C up to 100 °C max. 30 K/min | also for contaminating processes applicable |
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RTP-1200-100 Front loading
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100 x 100 mm², 100 mmø | 1200 °C | 150 K/sec | T = 1200 °C up to 400 °C better 200 K/min.
T = 400 °C up to 100 °C max. 30 K/min. | |
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